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Generating sub-30-nm polysilicon gates using PECVD amorphous carbon as hardmask and anti-reflective coating

Author(s):
Liu, W. ( Applied Materials, Inc. (USA) )
Mui, D. ( Applied Materials, Inc. (USA) )
Lill, T. ( Applied Materials, Inc. (USA) )
Wang, M.D. ( Applied Materials, Inc. (USA) )
Bencher, C. ( Applied Materials, Inc. (USA) )
Kwan, M. ( Applied Materials, Inc. (USA) )
Yeh, W. ( Applied Materials, Inc. (USA) )
Ebihara, T. ( Canon Inc. (USA) )
Oga, T. ( Canon Inc. (USA) )
4 more
Publication title:
Optical Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
Pub. Year:
2003
Vol.:
Part Two
Page(from):
841
Page(to):
848
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
Language:
English
Call no.:
P63600/5040
Type:
Conference Proceedings

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