Optical lithography solutions for sub-65-nm semiconductor devices
- Author(s):
Mulkens, J. ( ASML (Netherlands) ) McClay, J.A. ( ASML (USA) ) Tirri, B.A. ( ASML (USA) ) Brunotte, M. ( Carl Zeiss SMT AG (Germany) ) Mecking, B. ( Carl Zeiss SMT AG (Germany) ) Jasper, H. ( ASML (Netherlands) ) - Publication title:
- Optical Microlithography XVI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5040
- Pub. Year:
- 2003
- Vol.:
- Part Two
- Page(from):
- 753
- Page(to):
- 762
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- Language:
- English
- Call no.:
- P63600/5040
- Type:
- Conference Proceedings
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