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Water immersion optical lithography for 45-nm node

Author(s):
  • Smith, B.W. ( Rochester Institute of Technology (USA) )
  • Kang, H. ( Rochester Institute of Technology (USA) )
  • Bourov, A. ( Rochester Institute of Technology (USA) )
  • Cropanese, F. ( Rochester Institute of Technology (USA) )
  • Fan, Y. ( Rochester Institute of Technology (USA) )
Publication title:
Optical Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
Pub. Year:
2003
Vol.:
Part Two
Page(from):
679
Page(to):
689
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
Language:
English
Call no.:
P63600/5040
Type:
Conference Proceedings

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