Contamination rates of optical surfaces at 157 nm: impurities outgassed from construction materials and from photoresists
- Author(s):
Bloomstein, T.M. ( MIT Lincoln Lab. (USA) ) Sedlacek, J.H.C. ( MIT Lincoln Lab. (USA) ) Palmacci, S.T. ( MIT Lincoln Lab. (USA) ) Hardy, D.E. ( MIT Lincoln Lab. (USA) ) Liberman, V. ( MIT Lincoln Lab. (USA) ) Rothschild, M. ( MIT Lincoln Lab. (USA) ) - Publication title:
- Optical Microlithography XVI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5040
- Pub. Year:
- 2003
- Vol.:
- Part One
- Page(from):
- 650
- Page(to):
- 661
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- Language:
- English
- Call no.:
- P63600/5040
- Type:
- Conference Proceedings
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