Image performance and mask characterization of 157-nm alternating phase-shifting mask
- Author(s):
Chen, Y.-T. ( International SEMATECH (USA) ) Meute, J. ( International SEMATECH (USA) ) Dean, K.R. ( International SEMATECH (USA) ) Stark, D.R. ( International SEMATECH (USA) ) Schilz, C.M. ( Infineon Technologies AG (Germany) ) Dettmann, W. ( Infineon Technologies AG (Germany) ) Koehle, R. ( Infineon Technologies AG (Germany) ) Schiessl, B. ( Infineon Technologies AG (Germany) ) Degel, W. ( Carl Zeiss Microelectronic Systems GmbH (Germany) ) - Publication title:
- Optical Microlithography XVI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5040
- Pub. Year:
- 2003
- Vol.:
- Part One
- Page(from):
- 618
- Page(to):
- 628
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- Language:
- English
- Call no.:
- P63600/5040
- Type:
- Conference Proceedings
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