Novel in-situ focus monitor technology in attenuated PSM under actual illumination condition
- Author(s):
- Izuha, K. ( Toshiba Corp. (Japan) )
- Asano, M. ( Toshiba Corp. (Japan) )
- Fujisawa, T. ( Toshiba Corp. (Japan) )
- Inoue, S. ( Toshiba Corp. (Japan) )
- Publication title:
- Optical Microlithography XVI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5040
- Pub. Year:
- 2003
- Vol.:
- Part One
- Page(from):
- 590
- Page(to):
- 599
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- Language:
- English
- Call no.:
- P63600/5040
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Run-to-run CD error analysis and control monitoring of effective dose and focus
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
KrF attenuated PSM defect printability and detectability for 120-nm actual DRAM patterning process
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
CD control with effective exposure dose monitor technique in photolithography
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Automatic optical proximity correction with optimization of stepper condition
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Development of attenuating PSM shifter for F2 and high-transmission ArF lithography
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Evaluation of the attenuated PSM performance as the shifter transmittance and illumination systems
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
0.35-ヲフm i-line attenuated phase-shift mask(PSM)repair by focused-ion-beam technology
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Desirable reticle flatness from focus deviation standpoint in optical lithography
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |