Study of the influence of substrate topography on the focusing performance of advanced lithography scanners
- Author(s):
Fontaine, B.M.L. ( Advanced Micro Devices, Inc. (USA) ) Hauschild, J. ( ASML (Netherlands) ) Dusa, M.V. ( ASML (Netherlands) ) Acheta, A. ( Advanced Micro Devices, Inc. (USA) ) Apelgren, E.M. ( Advanced Micro Devices, Inc. (USA) ) Boonman, M. ( ASML (Netherlands) ) Krist, J. ( ASML (Netherlands) ) Khathuria, A. ( Advanced Micro Devices, Inc. (USA) ) Levinson, H.J. ( Advanced Micro Devices, Inc. (USA) ) Fumar-Pici, A. ( ASML (Netherlands) ) Pieters, M. ( ASML (Netherlands) ) - Publication title:
- Optical Microlithography XVI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5040
- Pub. Year:
- 2003
- Vol.:
- Part One
- Page(from):
- 570
- Page(to):
- 581
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- Language:
- English
- Call no.:
- P63600/5040
- Type:
- Conference Proceedings
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