A methodology to calculate line-end correction feature performance as a function of reticle cost

A methodology to calculate line-end correction feature performance as a function of reticle cost

Author(s):

III, L.S.M. ( Synopsys, Inc. (USA) )
Shiely, J.P. ( Synopsys, Inc. (USA) )
Rieger, M.L. ( Synopsys, Inc. (USA) )
Painter, B. ( Synopsys, Inc. (USA) )

Publication title:

Optical Microlithography XVI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5040

Pub. Year:

2003

Vol.:

Part One

Page(from):

441

Page(to):

449

Pages:

9

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

Language:

English

Call no.:

P63600/5040

Type:

Conference Proceedings

Details

TDL ID:	ZA00013029
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2003 : 16th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2003.02.25-2003.02.28

Similar Items:

1 Conference Proceedings A methodology to calculate line-end correction feature performance as a function of reticle cost Melvin, L.S., III, Shiely, J.P., Rieger, M.L., Painter, B. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Placing assist features in layout using a process model Melvin III, L. S., Shiely, J. P., Rieger, M. L. SPIE - The International Society of Optical Engineering
2 Conference Proceedings Advanced model formulations for optical and process proximity correction Beale, D.F., Shiely, J.P., Melvin, L.L., III, Rieger, M.L. SPIE - The International Society of Optical Engineering	8 Conference Proceedings Optimizing proximity correction for wafer fabrication processes J.P. Stirniman, M.L. Rieger Society of Photo-optical Instrumentation Engineers
3 Conference Proceedings OPC strategies to minimize mask cost and writing time Rieger,M.L., Mayhew,J.P., Li,J., Shiely,J.P. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Customizing proximity correction for process-specific objectives Rieger,M.L., Stirniman,J.P. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Multiple-stage optical proximity correction Beale, D.F., Shiely, J.P., Rieger, M.L. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Dual-mask model-based proximity correction for high-performance 0.10-μm CMOS process Palmer,S.R., Mason,M.E., Randall,J.N., Aton,T., Kim,K., Tritchkov,A.V., Burdorf,J., Rieger,M.L., Stirniman,J.P. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Model-based interpretation filtering for complex two-dimensional layout features Melvin, L.S., III, Shiely, J.P., Cork, C.M., Rieger, M.L. SPIE - The International Society of Optical Engineering	11 Conference Proceedings Model-based methodology for reducing OPC output pattern complexity Melvin, L.S., III, Rieger, M.L. SPIE - The International Society of Optical Engineering
6 Conference Proceedings Classical control theory applied to OPC correction segment convergence Painter, B., Melvin, L.L., III, Rieger, M.L. SPIE - The International Society of Optical Engineering	12 Conference Proceedings Verifying RET mask layouts Mayhew, J.P., Rieger, M.L., Li, J.W., Zhang, L., Tang, Z.W., Shiely, J.P. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12