Vortex via process: analysis and mask fabrication for contact CDs <80 nm

Vortex via process: analysis and mask fabrication for contact CDs <80 nm

Author(s):

Levenson, M.D. ( M.D. Levenson Consulting (USA) )

Tan, S.M. ( Univ. of Auckland (New Zealand) )

Dai, G. ( SIGMA-C (USA) )

Morikawa, Y. ( Dai Nippon Printing Co., Ltd. (Japan) )

Hayashi, N. ( Dai Nippon Printing Co., Ltd. (Japan) )

Ebihara, T. ( Canon USA, Inc. (USA) )

1 more

Publication title:

Optical Microlithography XVI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5040

Pub. Year:

2003

Vol.:

Part One

Page(from):

344

Page(to):

370

Pages:

27

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

Language:

English

Call no.:

P63600/5040

Type:

Conference Proceedings

Details

TDL ID:	ZA00013029
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2003 : 16th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2003.02.25-2003.02.28

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