The Impact of mask topography and resist effects on optical proximity correction in advanced alternating phase-shift process

The Impact of mask topography and resist effects on optical proximity correction in advanced alternating phase-shift process

Author(s):

Cheng, M. ( Texas A&M Univ. (USA) )
Ho, B.C.P. ( Tokyo Electron Texas LLC (USA) )
Guenther, D.E. ( International SEMATECH (USA) )

Publication title:

Optical Microlithography XVI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5040

Pub. Year:

2003

Vol.:

Part One

Page(from):

313

Page(to):

326

Pages:

14

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

Language:

English

Call no.:

P63600/5040

Type:

Conference Proceedings

Details

TDL ID:	ZA00013029
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2003 : 16th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2003.02.25-2003.02.28

Similar Items:

1 Conference Proceedings Line-edge roughness (LER) optimization on 300-mm DUV alternating phase shift (altPSM) processes Ho, B.C.P., Guenther, D., Cheng, M., Sotoodeh, K., Rudack, A., Yamaguchi, R., Brown, B., Ickes, M., Nafus, K. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Pattern-dependent correction of mask topography effects for alternating phase-shifting masks R.A. Ferguson, A.K. Wong, T.A. Brunner, L.W. Liebmann Society of Photo-optical Instrumentation Engineers
2 Conference Proceedings Simulation of sub-90-nm node complementary phase-shift processes with ArF lithography Cheng, M., Ho, B.C.P., Nafus, K. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Phase aware proximity correction for advanced masks Toublan,O., Sahouria,E.Y., Cobb,N.B., Do,T., Donnelly,T., Granik,Y., Schellenberg,F.M., Schiavone,P. SPIE - The International Society for Optical Engineering
3 Conference Proceedings Integration of alternating phase-shift mask technology into optical proximity correction Thiele,J., Friedrich,C., Dolainsky,C., Karakatsanis,P., Maurer,W. SPIE - The International Society for Optical Engineering	9 Conference Proceedings Second-level imaging of advanced alternating phase-shift masks using e-beam lithography Leibold, B., Butschke, J., Bettin, L., Beyer, D., Irmscher, M., Koepernik, C., Plontke, R., Vix, A., Voehringer, P. SPIE - The International Society of Optical Engineering
4 Conference Proceedings Optical coupling of lens, liquid and resist in immersion lithography: rigorous model and assessment Cheng, M., Ho, B.C.P., Yamaguchi, R., Yoshioka, K., Yaegashi, H. SPIE - The International Society of Optical Engineering	10 Conference Proceedings Understanding the impact of rigorous mask effects in the presence of empirical process models used in optical proximity correction (OPC) M. C. Lam, K. Adam SPIE - The International Society of Optical Engineering
5 Conference Proceedings Proximity effects in alternating aperture phase-shifting masks Pierrat,C. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Development of an i-line attenuated phase shift process for dual inlay interconnect lithography Sturtevant,J.L., Ho,B.C.P., Geiszler,V.C., Herrick,M.T., King,C.F., Carter,R.L., Roman,B.J., Litt,L.C., Smith,B., … SPIE - The International Society for Optical Engineering
6 Conference Proceedings Proximity effects of alternating phase-shift masks Maurer,W., Friedrich,C., Mader,L., Thiele,J. SPIE - The International Society for Optical Engineering	12 Conference Proceedings Alternating aperture phase shift mask process using e-beam lithography for the second level Koepernik, C., Butschke, J., Beyer, D., Irmscher, M., Leibold, B., Rausa, E., Plontke, R., Plumhoff, J., Voehringer, P. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12