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65-nm full-chip implementation using double dipole lithography

Author(s):
Hsu, S.D. ( ASML MaskTools, Inc. (USA) )
Chen, J.F. ( ASML MaskTools, Inc. (USA) )
Cororan, N. ( ASML MaskTools, Inc. (USA) )
Knose, W.T. ( ASML MaskTools, Inc. (USA) )
Broeke, D.J.V.D. ( ASML MaskTools, Inc. (USA) )
Laidig, T.L. ( ASML MaskTools, Inc. (USA) )
Wampler, K.E. ( ASML MaskTools, Inc. (USA) )
Shi, X. ( ASML MaskTools, Inc. (USA) )
Hsu, C.M. ( ASML MaskTools, Inc. (USA) )
Eurlings, M. ( ASML (Netherlands) )
Finders, J. ( ASML (Taiwan) )
Chiou, T.-B. ( ASML (Taiwan) )
Socha, R.J. ( ASML (USA) )
Conley, W. ( Motorola, Inc. (USA) )
Hsieh, Y.W. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) )
Tuan, S. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) )
Hsieh, F. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) )
12 more
Publication title:
Optical Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
Pub. Year:
2003
Vol.:
Part One
Page(from):
215
Page(to):
231
Pages:
17
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
Language:
English
Call no.:
P63600/5040
Type:
Conference Proceedings

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