Characterizing illumination angular uniformity with phase-shifting masks
- Author(s):
- McIntyre, G. ( Univ. of California/Berkeley (USA) )
- Neureuther, A.R. ( Univ. of California/Berkeley (USA) )
- Publication title:
- Optical Microlithography XVI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5040
- Pub. Year:
- 2003
- Vol.:
- Part One
- Page(from):
- 162
- Page(to):
- 170
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- Language:
- English
- Call no.:
- P63600/5040
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Initial experimental verification: characterizing tool illumination and PSM performance with phase-shifting masks
SPIE - The International Society of Optical Engineering |
7
Conference Proceedings
Illumination, mask, and tool effects on pattern and probe-based aberration monitors
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Phase shifting mask as a precision instrument for characterizing image-forming optical systems [5878-08]
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Interferometric-probe monitors for self-diagnostics of phase-shifting mask performance
SPIE - The International Society of Optical Engineering |
9
Conference Proceedings
Experimental verification of PSM polarimetry: monitoring polarization at 193-nrn high-NA with phase-shift masks [6154-13]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
10
Conference Proceedings
Focus shift and process latitude of contact holes on attenuated phase-shifting masks
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Monitoring polarization at 193nm high-numerical aperture with phase shift masks: experimental results and industrial outlook
Society of Photo-optical Instrumentation Engineers |
6
Conference Proceedings
Assessment of synchronous filtering as an alternative to phase-shifting masks at kl=0.4
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |