Optimizing and enhancing optical systems to meet the low k1 challenge

Optimizing and enhancing optical systems to meet the low k1 challenge

Author(s):

Flagello, D.G. ( ASML (USA) )

Socha, R.J. ( ASML (USA) )

Shi, X. ( ASML (USA) )

Schoot, J.B. ( ASML (Netherlands) )

Baselmans, J. ( ASML (Netherlands) )

Kerkhof, M.A. ( ASML (Netherlands) )

Boeij, W. ( ASML (Netherlands) )

Engelen, A. ( ASML (Netherlands) )

Carpaij, R. ( ASML (Netherlands) )

Noordman, O. ( ASML (Netherlands) )

Moers, M.H.P. ( ASML (Netherlands) )

Mulder, M. ( ASML (Netherlands) )

Finders, J. ( ASML (Netherlands) )

Greevenbroek, H. ( ASML (Netherlands) )

Schriever, M. ( Carl Zeiss SMT AG (Germany) )

Maul, M. ( Carl Zeiss SMT AG (Germany) )

Haidner, H. ( Carl Zeiss SMT AG (Germany) )

Goeppert, M. ( Carl Zeiss SMT AG (Germany) )

Wegmann, U. ( Carl Zeiss SMT AG (Germany) )

Graeupner, P. ( Carl Zeiss SMT AG (Germany) )

15 more

Publication title:

Optical Microlithography XVI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5040

Pub. Year:

2003

Vol.:

Part One

Page(from):

139

Page(to):

150

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

Language:

English

Call no.:

P63600/5040

Type:

Conference Proceedings

Details

TDL ID:	ZA00013029
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2003 : 16th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2003.02.25-2003.02.28

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