Impact of wavefront errors on low k1 processes at extremely high NA
- Author(s):
Graeupner, P. ( Carl Zeiss SMT AG (Germany) ) Garreis, R.B. ( Carl Zeiss SMT AG (Germany) ) Goehnermeier, A. ( Carl Zeiss SMT AG (Germany) ) Heil, T. ( Carl Zeiss SMT AG (Germany) ) Lowisch, M. ( Carl Zeiss SMT AG (Germany) ) Flagello, D.G. ( ASML (USA) ) - Publication title:
- Optical Microlithography XVI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5040
- Pub. Year:
- 2003
- Vol.:
- Part One
- Page(from):
- 119
- Page(to):
- 130
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- Language:
- English
- Call no.:
- P63600/5040
- Type:
- Conference Proceedings
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