Sensitivity of rinse, dry, and etch parameters

Sensitivity of rinse, dry, and etch parameters

Author(s):: Kim, S.-K. ( Hanyang Univ. (South Korea) )
Publication title:: Optical Microlithography XVI
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 5040
Pub. Year:: 2003
Vol.:: Part One
Page(from):: 112
Page(to):: 118
Pages:: 7
Pub. info.:: Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819448453 [0819448451]
Language:: English
Call no.:: P63600/5040
Type:: Conference Proceedings

Details

TDL ID:	ZA00013029
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2003 : 16th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2003.02.25-2003.02.28

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