Illumination pupil fill measurement and analysis and its application in scanner V-H bias characterization for 130-nm node and beyond

Illumination pupil fill measurement and analysis and its application in scanner V-H bias characterization for 130-nm node and beyond

Author(s):

Zhang, G. ( Texas Instruments Inc. (USA) )

Wang, C. ( Texas Instruments Inc. (USA) )

Tan, C.L. ( Texas Instruments Inc. (USA) )

Ilzhoefer, J.R. ( Texas Instruments Inc. (USA) )

Atkinson, C. ( Texas Instruments Inc. (USA) )

Renwick, S.P. ( Nikon Precision Inc. (USA) )

Slonaker, S.D. ( Nikon Precision Inc. (USA) )

Godfrey, D. ( Nikon Precision Inc. (USA) )

Fruga, C.H. ( Nikon Precision Inc. (USA) )

4 more

Publication title:

Optical Microlithography XVI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5040

Pub. Year:

2003

Vol.:

Part One

Page(from):

45

Page(to):

56

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

Language:

English

Call no.:

P63600/5040

Type:

Conference Proceedings

Details

TDL ID:	ZA00013029
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2003 : 16th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2003.02.25-2003.02.28

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