Blank Cover Image

Robust lithography application to prevent resist poisoning in BEOL

Author(s):
Publication title:
Advances in Resist Technology and Processing XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5039
Pub. Year:
2003
Vol.:
2
Pt.:
Poster Session
Page(from):
1425
Page(to):
1432
Pages:
8
Pub. info.:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
Language:
English
Call no.:
P63600/5039
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Transfer mechanism of defects on topcoat to resist pattern in immersion lithography process and effects on etching process

N. Takahashi, S. Shimura, T. Kawasaki

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Defectivity reduction studies for ArF immersion lithography

K. Matsunaga, T. Kondoh, H. Kato, Y. Kobayashi, K. Hayasaki, S. Ito, A. Yoshida, S. Shimura, T. Kawasaki, H. Kyoda

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Impregnation of resist with functional molecules using supercritical fluid: a new approach to resist engineering for advanced lithography

Niwa, T., Enomoto, M., Shimura, S., Kyoda, H., Kawasaki, T., Kitano, J.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Application of photodecomposable base concept to two-component deep-UV chemically amplified resists

Funato,S., Kawasaki,N., Kinoshita,Y., Masuda,S., Okazaki,H., Padmanaban,M., Yamamoto,T., Pawlowski,G.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Advanced resist process enabling implementation of CD controllability for 32 nm and beyond

S. Shimura, F. lwao, T. Kawasaki, D. Shannon, Y. Tanaka

Society of Photo-optical Instrumentation Engineers
9 Conference Proceedings Resist materials for 157-nm lithography

Toriumi,M., Ishikawa,S., Miyoshi,S., Naito,T., Yamazaki,T., Watanabe,M., Itani,T.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings 193 lithography and RELACS processing for BEOL lithography

DellaGuardia,R., Petrillo,K.E., Chen,J., Rabidoux,P., Dalton,T.J., Holmes,S.J., Hadel,L.M., Malone,K., Mahorowala,A.P., …

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Resist outgassing in electron projection lithography

Matsumiya, T., Ando, T., Yoshida, M., Ishikawa, K., Shimizu, S.

SPIE - The International Society of Optical Engineering
5 Conference Proceedings BEOL lithography for early development at the 65-nm node

DellaGuardia, R., Kwong, R.W., Li, W., Lawson, P., Burkhardt, M., Grauer, I.C., Wu, Q., Angyal, M., Hichri, H., …

SPIE - The International Society of Optical Engineering
11 Conference Proceedings 193-nm lithography and resist reflow for the BEOL

DellaGuardia, R.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Enabling 35nm double patterning contact imaging using a novel CD shrink process

Y. Yamada, M. M. Crouse, S. Dunn, T. Kawasaki, S. Shimura

Society of Photo-optical Instrumentation Engineers
12 Conference Proceedings Fabrication of 32-nm contact/via hole by photolithographic-friendly method

S. Kawasaki, S. Shimura, F. Iwao, E. Nishimura, M. Kushibiki

Society of Photo-optical Instrumentation Engineers
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12