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Impact of surfactant in developer on CD performance

Author(s):
Zhang, P. ( Air Products and Chemicals, Inc. (USA) )
Jaramillo, M. Jr., ( Air Products and Chemicals, Inc. (USA) )
King, D.M. ( Air Products and Chemicals, Inc. (USA) )
Markley, T.J. ( Air Products and Chemicals, Inc. (USA) )
Zarkov, Z. ( Air Products and Chemicals, Inc. (USA) )
Witko, D. ( ASML (USA) )
Paxton, T.A. ( ASML (USA) )
Davis, T. ( ASML (USA) )
3 more
Publication title:
Advances in Resist Technology and Processing XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5039
Pub. Year:
2003
Vol.:
2
Pt.:
Poster Session
Page(from):
1402
Page(to):
1408
Pages:
7
Pub. info.:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
Language:
English
Call no.:
P63600/5039
Type:
Conference Proceedings

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