Fabrication of integrated circuits with high yield using ultra-thin resist processes
- Author(s):
Peters, R.D. ( Motorola Digital DNA Labs. (USA) ) Postnikov, S.V. ( Motorola Digital DNA Labs. (USA) ) Cobb, J.L. ( Motorola Digital DNA Labs. (USA) ) Dakshina-Murthy, S. ( Advanced Micro Devices,INC. (USA) ) Stephens, T. ( Motorola Digital DNA Labs. (USA) ) Parker, C. ( Motorola Digital DNA Labs. (USA) ) Luckowski, E. ( Motorola Digital DNA Labs. (USA) ) Martinez, A.M. Jr., ( Motorola Digital DNA Labs. (USA) ) Wu, W. ( Motorola Digital DNA Labs. (USA) ) Hector, S.D. ( Motorola Digital DNA Labs. (USA) ) - Publication title:
- Advances in Resist Technology and Processing XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5039
- Pub. Year:
- 2003
- Vol.:
- 2
- Pt.:
- Poster Session
- Page(from):
- 1390
- Page(to):
- 1401
- Pages:
- 12
- Pub. info.:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- Language:
- English
- Call no.:
- P63600/5039
- Type:
- Conference Proceedings
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