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Fabrication of integrated circuits with high yield using ultra-thin resist processes

Author(s):
Peters, R.D. ( Motorola Digital DNA Labs. (USA) )
Postnikov, S.V. ( Motorola Digital DNA Labs. (USA) )
Cobb, J.L. ( Motorola Digital DNA Labs. (USA) )
Dakshina-Murthy, S. ( Advanced Micro Devices,INC. (USA) )
Stephens, T. ( Motorola Digital DNA Labs. (USA) )
Parker, C. ( Motorola Digital DNA Labs. (USA) )
Luckowski, E. ( Motorola Digital DNA Labs. (USA) )
Martinez, A.M. Jr., ( Motorola Digital DNA Labs. (USA) )
Wu, W. ( Motorola Digital DNA Labs. (USA) )
Hector, S.D. ( Motorola Digital DNA Labs. (USA) )
5 more
Publication title:
Advances in Resist Technology and Processing XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5039
Pub. Year:
2003
Vol.:
2
Pt.:
Poster Session
Page(from):
1390
Page(to):
1401
Pages:
12
Pub. info.:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
Language:
English
Call no.:
P63600/5039
Type:
Conference Proceedings

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