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Reduction of implantation shadowing effect by dual-wavelength exposure photo process

Author(s):
  • Gu, Y. ( Integrated Device Technology, Inc. (USA) )
  • Chou, D. ( Integrated Device Technology, Inc. (USA) )
  • Lee, S.Y. ( Integrated Device Technology, Inc. (USA) )
  • Roche, W.R. ( Integrated Device Technology, Inc. (USA) )
  • Sturtevant, J.L. ( Integrated Device Technology, Inc. (USA) )
Publication title:
Advances in Resist Technology and Processing XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5039
Pub. Year:
2003
Vol.:
2
Pt.:
Poster Session
Page(from):
1312
Page(to):
1318
Pages:
7
Pub. info.:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
Language:
English
Call no.:
P63600/5039
Type:
Conference Proceedings

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