TMAH soak process optimization with DNQ positive resist for lift-off applications
- Author(s):
- Mullen, S.K. ( Clariant Corp. (USA) )
- Toukhy, M.A. ( Clariant Corp. (USA) )
- Lu, P.-H. ( Clariant Corp. (USA) )
- Dixit, S.S. ( Clariant Corp. (USA) )
- Sellers, P. ( Clariant Corp. (USA) )
- Publication title:
- Advances in Resist Technology and Processing XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5039
- Pub. Year:
- 2003
- Vol.:
- 2
- Pt.:
- Poster Session
- Page(from):
- 1304
- Page(to):
- 1311
- Pages:
- 8
- Pub. info.:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- Language:
- English
- Call no.:
- P63600/5039
- Type:
- Conference Proceedings
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