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Diffusion parameter analysis for chemical amplification resists as a function of resist process

Author(s):
Kim, M.-S. ( Hynix Semiconductor, Inc. (South Korea) )
Paek, S.-W. ( Hynix Semiconductor, Inc. (South Korea) )
Kwak, D.-S. ( Hynix Semiconductor, Inc. (South Korea) )
Kim, H.-J. ( Hynix Semiconductor, Inc. (South Korea) )
Lee, C.-S. ( Hynix Semiconductor, Inc. (South Korea) )
Gil, M.-G. ( Hynix Semiconductor, Inc. (South Korea) )
Song, Y.-W. ( Hynix Semiconductor, Inc. (South Korea) )
2 more
Publication title:
Advances in Resist Technology and Processing XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5039
Pub. Year:
2003
Vol.:
2
Pt.:
Poster Session
Page(from):
1242
Page(to):
1247
Pages:
6
Pub. info.:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
Language:
English
Call no.:
P63600/5039
Type:
Conference Proceedings

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