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Line-edge roughness (LER) optimization on 300-mm DUV alternating phase shift (altPSM) processes

Author(s):
Ho, B.C.P. ( Tokyo Electron Texas, LLC (USA) )
Guenther, D. ( International SEMATECH (USA) )
Cheng, M. ( Texas A&M Univ. (USA) )
Sotoodeh, K. ( International SEMATECH (USA) )
Rudack, A. ( International SEMATECH (USA) )
Yamaguchi, R. ( Tokyo Electron Texas, LLC (USA) )
Brown, B. ( Tokyo Electron Texas, LLC (USA) )
Ickes, M. ( Tokyo Electron Texas, LLC (USA) )
Nafus, K. ( Tokyo Electron Texas, LLC (USA) )
4 more
Publication title:
Advances in Resist Technology and Processing XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5039
Pub. Year:
2003
Vol.:
2
Pt.:
Poster Session
Page(from):
1229
Page(to):
1241
Pages:
13
Pub. info.:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
Language:
English
Call no.:
P63600/5039
Type:
Conference Proceedings

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