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Synthesis and evaluation of novel organoelement resists for EUV lithography

Author(s):
Dai, J. ( Cornell Univ. (USA) )
Ober, C.K. ( Cornell Univ. (USA) )
Kim, S.-O. ( Univ. of Wisconsin/Madison (USA) )
Nealey, P.F. ( Univ. of Wisconsin/Madison (USA) )
Golovkina, V. ( Univ. of Wisconsin/Madison (USA) )
Shin, J. ( Univ. of Wisconsin/Madison (USA) )
Wang, L. ( Univ. of Wisconsin/Madison (USA) )
Cerrina, F. ( Univ. of Wisconsin/Madison (USA) )
3 more
Publication title:
Advances in Resist Technology and Processing XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5039
Pub. Year:
2003
Vol.:
2
Pt.:
Poster Session
Page(from):
1164
Page(to):
1172
Pages:
9
Pub. info.:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
Language:
English
Call no.:
P63600/5039
Type:
Conference Proceedings

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