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Investigation on the role of residual casting solvent in photolithographic behavior in 193-nm resists

Author(s):
Kang, J.-H. ( Dongjin Semichem Co., Ltd. (South Korea) )
Oh, S.-K. ( Dongjin Semichem Co., Ltd. (South Korea) )
Son, E.-K. ( Dongjin Semichem Co., Ltd. (South Korea) )
Kim, J.-W. ( Dongjin Semichem Co., Ltd. (South Korea) )
Kim, Y.-H. ( Dongjin Semichem Co., Ltd. (South Korea) )
Choi, Y.-J. ( Dongjin Semichem Co., Ltd. (South Korea) )
Kim, D.-B. ( Dongjin Semichem Co., Ltd. (South Korea) )
Kim, J. ( Dongjin Semichem Co., Ltd. (South Korea) )
3 more
Publication title:
Advances in Resist Technology and Processing XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5039
Pub. Year:
2003
Vol.:
2
Pt.:
Poster Session
Page(from):
1052
Page(to):
1062
Pages:
11
Pub. info.:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
Language:
English
Call no.:
P63600/5039
Type:
Conference Proceedings

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