Influence of film thickness, molecular weight, and substrate on the physical properties of photoresist polymer thin films

Influence of film thickness, molecular weight, and substrate on the physical properties of photoresist polymer thin films

Author(s):

Singh, L. ( Georgia Institute of Technology (USA) )
Ludovice, P.J. ( Georgia Institute of Technology (USA) )
Henderson, C.L. ( Georgia Institute of Technology (USA) )

Publication title:

Advances in Resist Technology and Processing XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5039

Pub. Year:

2003

Vol.:

2

Pt.:

Poster Session

Page(from):

1008

Page(to):

1018

Pages:

11

Pub. info.:

Bellingham, CA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448446 [0819448443]

Language:

English

Call no.:

P63600/5039

Type:

Conference Proceedings

Details

TDL ID:	ZA00013027
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in Resist Technology and Processing
Conf. info. (Number):	2003 : 20th
Conf. info. (Venue):	Santa Clara, CA
Conf. info. (Date):	2003.02.24-2003.02.26
Note for article:	Poster Session ; 5039-115

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