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193-nm multilayer imaging systems

Author(s):
Meador, J.D. ( Brewer Science, Inc. (USA) )
Holmes, D. ( Brewer Science, Inc. (USA) )
DiMenna, W. ( Brewer Science, Inc. (USA) )
Nagatkina, M.I. ( Brewer Science, Inc. (USA) )
Rich, M.D. ( Brewer Science, Inc. (USA) )
Flaim, T.D. ( Brewer Science, Inc. (USA) )
Bennett, R. ( Brewer Science, Inc. (USA) )
Kobayashi, I. ( Nissan Chemical Industries, Ltd. (Japan) )
3 more
Publication title:
Advances in Resist Technology and Processing XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5039
Pub. Year:
2003
Vol.:
2
Pt.:
Poster Session
Page(from):
948
Page(to):
959
Pages:
12
Pub. info.:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
Language:
English
Call no.:
P63600/5039
Type:
Conference Proceedings

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