Blank Cover Image

New materials for 193-nm BARC application

Author(s):
Publication title:
Advances in Resist Technology and Processing XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5039
Pub. Year:
2003
Vol.:
2
Pt.:
Poster Session
Page(from):
872
Page(to):
877
Pages:
6
Pub. info.:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
Language:
English
Call no.:
P63600/5039
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings New BARC materials for the 65-nm node in 193-nm lithography

Neef, C.J., Krishnamurthy, V., Nagatkina, M.I., Bryant, E., Windsor, M., Nesbit, C.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings 193nm dual layer organic BARCS for high NA immersion lithography

Montgomery, P. K., Peters, R., Garza, C., Cobb, J., Darlington, B., Parker, C., Filipiak, S., Babbitt, D.

SPIE - The International Society of Optical Engineering
2 Conference Proceedings New materials for 193-nm bottom antireflective coatings

Weimer, M., Krishnamurthy, V., Fowler, S., Nesbit, C., Claypool, J.B.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings New materials for 193-nm trilayer imaging

Meador, J.D., Holmes, D., Nagatkina, M.I., Puligadda, R., Gum, D., Bennett, R., Sun, S.X., Enomoto, T.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Effects of bake temperature and surface modifications on hardmask materials for trilayer applications

C. J. Neef, J. Finazzo, C. Nesbit, M. Weigand

Society of Photo-optical Instrumentation Engineers
9 Conference Proceedings Improved crosslinkable polymeric binders for 193-nm bottom antireflective coatings (BARCs)

Meador,J.D., Shao,X., Bhave,M., Cox,C., Thompson,J., Thomas,D.L., Gibbons,S., Farnsworth,A., Rich,M.D.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings A novel 248-nm wet-developable BARC for trench applications

C. J. Neef, D. Thomas

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Marathon testing of optical materials for 193-nm lithographic applications

Liberman,V., Rothschild,M., Sedlacek,J.H., Uttaro,R.S., Bates,A.K., Peski,C.K.Van

SPIE - The International Society for Optical Engineering
5 Conference Proceedings Development of 193-nm wet BARCs for implant applications [6153-100]

Meador, J., Beaman, C., Lowes, J., Washburn, C., Mercado, R., Nagatkina, M., Stroud, C.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Rinse additives for defect suppression in 193-nm and 248-nm lithogrophy

Skordas, S., Burns, R.L., Goldfarb, D.L., Burns, S.D., Angelopoulos, M., Brodsky, C.J., Lawson, M.C., Pillette, C.J., …

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Testing of optical materials for 193-nm applications

Liberman, V., Rothschild, M., Sedlacek, J.H.C., Uttaro, R.S., Grenville, A., Bates, A.K., Van Peski, C.

SPIE
12 Conference Proceedings Application of new thin BARC technology for KrF lithography at 80-nm node device

Kim, M.-S., Shim, K.-C., Kim, H.-J., Kwon, K.-S., Lee, H.-G., Lee, C.-S., Gil, M.-G., Song, Y.-W.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12