PEB sensitivity studies of ArF resist

PEB sensitivity studies of ArF resist

Author(s):

Lee, S.H. ( Clariant Corp. (USA) )

Kim, W.-K. ( Clariant Corp. (USA) )

Rahman, D.M. ( Clariant Corp. (USA) )

Kudo, T. ( Clariant Corp. (USA) )

Timko, A. ( Clariant Corp. (USA) )

Anyadiegwu, C. ( Clariant Corp. (USA) )

McKenzie, D.S. ( Clariant Corp. (USA) )

Kanda, T. ( Clariant Japan K.K. (Japan) )

Dammel, R.R. ( Clariant Corp. (USA) )

Padmanaban, M. ( Clariant Corp. (USA) )

5 more

Publication title:

Advances in Resist Technology and Processing XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5039

Pub. Year:

2003

Vol.:

2

Pt.:

Poster Session

Page(from):

798

Page(to):

806

Pages:

9

Pub. info.:

Bellingham, CA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448446 [0819448443]

Language:

English

Call no.:

P63600/5039

Type:

Conference Proceedings

Details

TDL ID:	ZA00013027
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in Resist Technology and Processing
Conf. info. (Number):	2003 : 20th
Conf. info. (Venue):	Santa Clara, CA
Conf. info. (Date):	2003.02.24-2003.02.26
Note for article:	Poster Session ; 5039-90

Similar Items:

1 Conference Proceedings PEB sensitivity studies of ArF resists: II. Polymer and solvent effects Hong, C.-S., Lee, S.-H., Kim, W.-K., Kudo, T., Timko, A., Mckenzie, D., Anyadiegwu, C., Rahman, D.M., Lin, G., Dammel, … SPIE - The International Society of Optical Engineering	7 Conference Proceedings E-beam curing effects on the etch and CD-SEM stability of 193-nm resists Padmanaban, M., Alemy, E., Dammel, R.R., Kim, W.-K., Kudo, T., Lee, S.-H., McKenzie, D.S., Orsi, A., Rahman, D., Chen, … SPIE-The International Society for Optical Engineering
2 Conference Proceedings Performance of imide and methide onium PAGs in 193-nm resist formulations Padmanaban, M., Dammel, R.R., Lee, S.H., Kim, W.-K., Kudo, T., McKenzie, D.S., Rahman, D. SPIE-The International Society for Optical Engineering	8 Conference Proceedings High-performance 193-nm resist composition using hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate Rahman, M.D., Alemy, E., Conley, W., Miller, D., Dammel, R.R., Kim, W.-K., Kudo, T., Lee, S.-H., Masuda, S., McKenzie, … SPIE-The International Society for Optical Engineering
3 Conference Proceedings Versatility in lithographic performance of advanced 193 nm contact hole resist [6153-86] Kudo, T., Lin, G., Lee, D., Rahman, D., Timko, A., Mckenzie, D., Anyadiegwu, C., Chiu, S., Houlihan, F., Rentkiewicz, … SPIE - The International Society of Optical Engineering	9 Conference Proceedings Illumination, acid diffusion, and process optimization considerations for 193-nm contact hole resists Kudo, T., Alemy, E.L., Dammel, R.R., Kim, W.-K., Lee, S.-H., Masuda, S., McKenzie, D.S., Rahman, M.D., Romano, A.R., … SPIE-The International Society for Optical Engineering
4 Conference Proceedings CD changes of 193-nm resists during SEM measurement Kudo,T., Bae,J.-B., Dammel,R.R., Kim,W.-K., McKenzie,D.S., Rahman,M.D., Padmanaban,M., Ng,W. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Study of the effect of amine additives on LWR and LER [6153-44] Houlihan, F. M., Rentkiewicz, D., Lin, G., Rahman, D., Mackenzie, D., Timko, A., Kudo, T., Anyadiegwu, C., Thiyagarajan, … SPIE - The International Society of Optical Engineering
5 Conference Proceedings 193 nm resist composition using hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate [6153-14] Rahman, M D, Chakrapani, S, Anyadiegwu, C, Lin, G, Timko, A, Houlihan, F, Rentkiewicz, D, Kudo, T, McKenzie, D, Dammel, … SPIE - The International Society of Optical Engineering	11 Conference Proceedings Effect of the rinse solution to avoid 193-nm resist line collapse: a study for modification of resist polymer and process conditions Masuda, S., Kobayashi, M., Kim, W.-K., Anyadiegwu, C., Padmanaban, M., Dammel, R.R., Tanaka, K., Yamada, Y. SPIE - The International Society of Optical Engineering
6 Conference Proceedings Novel hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate for 193-nm resist compositions Rahman,M.D., McKenzie,D.S., Bae,J.-B., Kudo,T., Kim,W.-K., Padmanaban,M., Dammel,R.R. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Application of photodecomposable base concept to 193-nm resists Padmanaban,M., Bae,J.-B., Cook,M.M., Kim,W.-K., Klauck-Jacobs,A., Kudo,T., Rahman,M.D., Dammel,R.R., Byers,J.D. SPIE - The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12