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Below 70-nm contact hole pattern with RELACS process on ArF resist

Author(s):
Terai, M. ( Mitsubishi Electric Corp. (Japan) )
Toyoshima, T. ( Mitsubishi Electric Corp. (Japan) )
Ishibashi, T. ( Mitsubishi Electric Corp. (Japan) )
Tarutani, S. ( Mitsubishi Electric Corp. (Japan) )
Takahashi, K. ( Clariant Japan K.K. (Japan) )
Takano, Y. ( Clariant Japan K.K. (Japan) )
Tanaka, H. ( Clariant Japan K.K. (Japan) )
2 more
Publication title:
Advances in Resist Technology and Processing XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5039
Pub. Year:
2003
Vol.:
2
Pt.:
Poster Session
Page(from):
789
Page(to):
797
Pages:
9
Pub. info.:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
Language:
English
Call no.:
P63600/5039
Type:
Conference Proceedings

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