Nonshrinkable photoresists for ArF lithography
- Author(s):
- Kim, J.-B. ( Korea Advanced Institute of Science and Technology (South Korea) )
- Oh, T.H. ( Korea Advanced Institute of Science and Technology (South Korea) )
- Choi, J.-H. ( Korea Advanced Institute of Science and Technology (South Korea) )
- Lee, J.-J. ( Samsung Advanced Institute of Technology (South Korea) )
- Publication title:
- Advances in Resist Technology and Processing XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5039
- Pub. Year:
- 2003
- Vol.:
- 2
- Pt.:
- Poster Session
- Page(from):
- 689
- Page(to):
- 697
- Pages:
- 9
- Pub. info.:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- Language:
- English
- Call no.:
- P63600/5039
- Type:
- Conference Proceedings
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