Mechanistic understanding of post-etch roughness in 193-nm photoresists
- Author(s):
Bae, Y.C. ( Shipley Co. LLC (USA) ) Barclay, G.G. ( Shipley Co. LLC (USA) ) Bolton, P.J. ( Shipley Co. LLC (USA) ) Kavanagh, R.J. ( Shipley Co. LLC (USA) ) Bu, L. ( Shipley Co. LLC (USA) ) Kobayashi, T. ( Shipley Co. LLC (USA) ) Adams, T. ( Shipley Co. LLC (USA) ) Pugliano, N. ( Shipley Co. LLC (USA) ) Thackeray, J.W. ( Shipley Co. LLC (USA) ) - Publication title:
- Advances in Resist Technology and Processing XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5039
- Pub. Year:
- 2003
- Vol.:
- 2
- Pt.:
- Poster Session
- Page(from):
- 665
- Page(to):
- 671
- Pages:
- 7
- Pub. info.:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- Language:
- English
- Call no.:
- P63600/5039
- Type:
- Conference Proceedings
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