Baking study of fluorinated 157-nm resist
- Author(s):
Houlihan, F.M. ( Clariant Corp. (USA) ) Sakamuri, R. ( Clariant Corp. (USA) ) Romano, A.R. ( Clariant Corp. (USA) ) Dammel, R.R. ( Clariant Corp. (USA) ) Conley, W. ( International SEMATECH (USA) ) Rich, G.K. ( International SEMATECH (USA) ) Miller, D. ( International SEMATECH (USA) ) Rhodes, L.F. ( Promerus LLC (USA) ) McDaniels, J.M. ( Promerus LLC (USA) ) Chang, C. ( Promerus LLC (USA) ) - Publication title:
- Advances in Resist Technology and Processing XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5039
- Pub. Year:
- 2003
- Vol.:
- 1
- Pt.:
- Poster Session
- Page(from):
- 641
- Page(to):
- 649
- Pages:
- 9
- Pub. info.:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- Language:
- English
- Call no.:
- P63600/5039
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Cycloolefin/cyanoacrylate (COCA) copolymers for 193-nm and 157-nm lithography
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Study of barrier coats for protection against airborne contamination in 157-nm lithography
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
193 nm single layer resist based on poly(norbornene-alt-maleic anhydride) derivatives: the interplay of the chemical structure of components and lithographic …
American Chemical Society |