Negative photoresist for 157-nm microlithography: a progress report
- Author(s):
Conley, W. ( International SEMATECH (USA) ) Trinque, B.C. ( Univ. of Texas at Austin (USA) ) Miller, D. ( International SEMATECH (USA) ) Caporale, S. ( Univ. of Texas at Austin (USA) ) Osborn, B.P. ( Univ. of Texas at Austin (USA) ) Kumamoto, S. ( Univ. of Texas at Austin (USA) ) Pinnow, M.J. ( Univ. of Texas at Austin (USA) ) Callahan, R. ( Univ. of Texas at Austin (USA) ) Chambers, C.R. ( Univ. of Texas at Austin (USA) ) Lee, G.S. ( International SEMATECH (USA) ) Zimmerman, P. ( International SEMATECH (USA) ) Willson, C.G. ( Univ. of Texas at Austin (USA) ) - Publication title:
- Advances in Resist Technology and Processing XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5039
- Pub. Year:
- 2003
- Vol.:
- 1
- Pt.:
- Poster Session
- Page(from):
- 622
- Page(to):
- 626
- Pages:
- 5
- Pub. info.:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- Language:
- English
- Call no.:
- P63600/5039
- Type:
- Conference Proceedings
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