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Performances of resists for 157-nm lithography based on monocyclic fluoropolymers

Author(s):
Ishikawa, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Irie, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Itani, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Kawaguchi, Y. ( Asahi Glass Co., Ltd. (Japan) )
Yokokoji, O. ( Asahi Glass Co., Ltd. (Japan) )
Kodama, S.-. ( Asahi Glass Co., Ltd. (Japan) )
1 more
Publication title:
Advances in Resist Technology and Processing XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5039
Pub. Year:
2003
Vol.:
1
Pt.:
Poster Session
Page(from):
580
Page(to):
588
Pages:
9
Pub. info.:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
Language:
English
Call no.:
P63600/5039
Type:
Conference Proceedings

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