Performances of resists for 157-nm lithography based on monocyclic fluoropolymers
- Author(s):
Ishikawa, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Irie, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Itani, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Kawaguchi, Y. ( Asahi Glass Co., Ltd. (Japan) ) Yokokoji, O. ( Asahi Glass Co., Ltd. (Japan) ) Kodama, S.-. ( Asahi Glass Co., Ltd. (Japan) ) - Publication title:
- Advances in Resist Technology and Processing XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5039
- Pub. Year:
- 2003
- Vol.:
- 1
- Pt.:
- Poster Session
- Page(from):
- 580
- Page(to):
- 588
- Pages:
- 9
- Pub. info.:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- Language:
- English
- Call no.:
- P63600/5039
- Type:
- Conference Proceedings
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