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Fluoropolymer resists for 157 nm lithography

Author(s):
Vohra, V.R. ( Cornell Univ. (USA) )
Liu, X.-Q. ( Cornell Univ. (USA) )
Douki, K. ( Cornell Univ. (USA) )
Ober, C.K. ( Cornell Univ. (USA) )
Conley, W. ( International SEMATECH (USA) )
Zimmerman, P. ( International SEMATECH (USA) )
Miller, D. ( International SEMATECH (USA) )
2 more
Publication title:
Advances in Resist Technology and Processing XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5039
Pub. Year:
2003
Vol.:
1
Pt.:
Poster Session
Page(from):
539
Page(to):
547
Pages:
9
Pub. info.:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
Language:
English
Call no.:
P63600/5039
Type:
Conference Proceedings

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