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Study of resist outgassing by F2 laser irradiation

Author(s):
Itakura, Y. ( Komatsu Ltd. (Japan) )
Kawasa, Y. ( Komatsu Ltd. (Japan) )
Sumitani, A. ( Komatsu Ltd. (Japan) )
Ishikawa, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Irie, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Itani, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
1 more
Publication title:
Advances in Resist Technology and Processing XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5039
Pub. Year:
2003
Vol.:
1
Pt.:
Poster Session
Page(from):
524
Page(to):
532
Pages:
9
Pub. info.:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
Language:
English
Call no.:
P63600/5039
Type:
Conference Proceedings

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