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157-nm bilayer resist: patterning and etching performance

Author(s):
  • Miyoshi, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
  • Furukawa, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
  • Kawaguchi, E. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
  • Itani, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Publication title:
Advances in Resist Technology and Processing XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5039
Pub. Year:
2003
Vol.:
1
Pt.:
Session 10
Page(from):
462
Page(to):
471
Pages:
10
Pub. info.:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
Language:
English
Call no.:
P63600/5039
Type:
Conference Proceedings

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