Monitoring of photo-resist poisoning

Monitoring of photo-resist poisoning

Author(s):

Simon, J. ( CEA-LETI (France) )
Weisbuch, F. ( STMicroelectronics (France) )
Quere, Y. ( CEA-LETI (France) )
Louveau, O. ( STMicroelectronics (France) )
Bourlot, C. ( CEA-LETI (France) )

Publication title:

Advances in Resist Technology and Processing XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5039

Pub. Year:

2003

Vol.:

1

Pt.:

Session 7

Page(from):

303

Page(to):

309

Pages:

7

Pub. info.:

Bellingham, CA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448446 [0819448443]

Language:

English

Call no.:

P63600/5039

Type:

Conference Proceedings

Details

TDL ID:	ZA00013027
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in Resist Technology and Processing
Conf. info. (Number):	2003 : 20th
Conf. info. (Venue):	Santa Clara, CA
Conf. info. (Date):	2003.02.24-2003.02.26
Note for article:	Session 7. Advanced Resist Processing ; 5039-34

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