Contact printing to the 45-nm node using a binary mask and 248-nm lithography
- Author(s):
- Suhm, K.E. ( Microchip Technology, Inc. (USA) )
- Baker, D.C. ( Microchip Technology, Inc. (USA) )
- Hesse, B. ( Microchip Technology, Inc. (USA) )
- Clark, K. ( Microchip Technology, Inc. (USA) )
- Coleman, S. ( Canon USA Inc. (USA) )
- Publication title:
- Advances in Resist Technology and Processing XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5039
- Pub. Year:
- 2003
- Vol.:
- 1
- Pt.:
- Session 7
- Page(from):
- 277
- Page(to):
- 290
- Pages:
- 14
- Pub. info.:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- Language:
- English
- Call no.:
- P63600/5039
- Type:
- Conference Proceedings
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