Imaging and photochemistry studies of fluoropolymers for 193-nm lithography

Imaging and photochemistry studies of fluoropolymers for 193-nm lithography

Author(s):

Conley, W. ( International SEMATECH (USA) )
Zimmerman, P. ( International SEMATECH (USA) )
Miller, D. ( International SEMATECH (USA) )
Lee, G.S. ( International SEMATECH (USA) )

Publication title:

Advances in Resist Technology and Processing XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5039

Pub. Year:

2003

Vol.:

1

Pt.:

Session 5

Page(from):

207

Page(to):

212

Pages:

6

Pub. info.:

Bellingham, CA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448446 [0819448443]

Language:

English

Call no.:

P63600/5039

Type:

Conference Proceedings

Details

TDL ID:	ZA00013027
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in Resist Technology and Processing
Conf. info. (Number):	2003 : 20th
Conf. info. (Venue):	Santa Clara, CA
Conf. info. (Date):	2003.02.24-2003.02.26
Note for article:	Session 5. Materials for 193-nm Resists ; 5039-24

Similar Items:

1 Conference Proceedings Advances in TFE-based fluoropolymers for 157-nm lithography: a progress report Sharif, I., DesMarteau, D., Ford, L., Shafer, G.J., Thomas, B., Conley, W., Zimmerman, P., Miller, D., Lee, G.S., … SPIE-The International Society for Optical Engineering	7 Conference Proceedings Implications of immersion lithography on 193-nm photoresists Taylor, J.C., Chambers, C.R., Deschner, R., LeSuer, R.J., Conley, W.E., Burns, S.D., Willson, C.G. SPIE - The International Society of Optical Engineering
2 Conference Proceedings Fluoropolymer resists for 157 nm lithography Vohra, V.R., Liu, X.-Q., Douki, K., Ober, C.K., Conley, W., Zimmerman, P., Miller, D. SPIE-The International Society for Optical Engineering	8 Conference Proceedings 0.31k1 ArF lithography for 70-nm DRAM Chumanov, G., Evanoff, D. D. Jr., Luzinov, I., Klep, V., Zdryko, B., Conley, W., Zimmerman, P. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Negative photoresist for 157-nm microlithography: a progress report Conley, W., Trinque, B.C., Miller, D., Caporale, S., Osborn, B.P., Kumamoto, S., Pinnow, M.J., Callahan, R., Chambers, … SPIE-The International Society for Optical Engineering	9 Conference Proceedings Continuing 193nm optical lithography for 32nm imaging and beyond E. C. Piscani, D. Ashworth, J. Byers, C. Van Peski, P. Zimmerman Society of Photo-optical Instrumentation Engineers
4 Conference Proceedings Novel high-index resists for 193-nm immersion lithography and beyond I. Blakey, L. Chen, B. Dargaville, H. Liu, A. Whittaker, W. Conley, E. Piscani, G. Rich, A. Williams, P. Zimmerman SPIE - The International Society of Optical Engineering	10 Conference Proceedings Parameter extraction for 157-nm photoresists Bendik, J.J., Conley, W., Miller, D.A., Zimmerman, P., Dean, K.R., Petersen, J.S., Byers, J. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Dissolution inhibitors for 157-nm photolithography Chambers, C.R., Kusumoto, S., Lee, G.S., Vasudev, A., Walthal, L., Osborn, B.P., Zimmerman, P., Conley, W.E., Willson, … SPIE-The International Society for Optical Engineering	11 Conference Proceedings Nanocomposite liquids for 193 nm immersion lithography: a progress report George Chumanov, David D. Evanoff, Igor Luzinov, Viktor Klep, Bogdan Zdryko, Will Conley, Paul Zimmerman SPIE - The International Society of Optical Engineering
6 Conference Proceedings A new monocyclic fluoropolymer for 157-nm and 193-nm photoresists Houlihan, F., Sakamuri, R., Hamilton, K., Dimerli, A., Rentkiewicz, D., Romano, A., Dammel, R. R., Wei, Y., Stepanenko, … SPIE - The International Society of Optical Engineering	12 Conference Proceedings Advances in resists for 157-nm microlithography Trinque, B.C., Osborn, B.P., Chambers, C.R., Hsieh, Y.-T., Corry, S.B., Chiba, T., Hung, R.J., Tran, H.V., Zimmerman, … SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12