Hardmask technology for sub-100 nm lithographic imaging
- Author(s):
Babich, K. ( IBM Thomas J. Watson Research Ctr. (USA) ) Mahorowala, A.P. ( IBM Thomas J. Watson Research Ctr. (USA) ) Medeiros, D.R. ( IBM Thomas J. Watson Research Ctr. (USA) ) Pfeiffer, D. ( IBM Thomas J. Watson Research Ctr. (USA) ) Petrillo, K.E. ( IBM Thomas J. Watson Research Ctr. (USA) ) Angelopoulos, M. ( IBM Thomas J. Watson Research Ctr. (USA) ) Grill, A. ( IBM Thomas J. Watson Research Ctr. (USA) ) Patel, V. ( IBM Thomas J. Watson Research Ctr. (USA) ) Halle, S. ( IBM SRDC (USA) ) Brunner, T.A. ( IBM SRDC (USA) ) Conti, R. ( IBM SRDC (USA) ) Allen, S.D. ( IBM SRDC (USA) ) Wise, R. ( IBM SRDC (USA) ) - Publication title:
- Advances in Resist Technology and Processing XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5039
- Pub. Year:
- 2003
- Vol.:
- 1
- Pt.:
- Session 4
- Page(from):
- 152
- Page(to):
- 165
- Pages:
- 14
- Pub. info.:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- Language:
- English
- Call no.:
- P63600/5039
- Type:
- Conference Proceedings
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