Dissolution inhibitors for 157-nm photolithography

Dissolution inhibitors for 157-nm photolithography

Author(s):

Chambers, C.R. ( Univ. of Texas at Austin (USA) )

Kusumoto, S. ( Univ. of Texas at Austin (USA) )

Lee, G.S. ( International SEMATECH (USA) )

Vasudev, A. ( Univ. of Texas at Austin (USA) )

Walthal, L. ( Univ. of Texas at Austin (USA) )

Osborn, B.P. ( Univ. of Texas at Austin (USA) )

Zimmerman, P. ( International SEMATECH (USA) )

Conley, W.E. ( International SEMATECH (USA) )

Willson, C.G. ( Univ. of Texas at Austin (USA) )

4 more

Publication title:

Advances in Resist Technology and Processing XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5039

Pub. Year:

2003

Vol.:

1

Pt.:

Session 3

Page(from):

93

Page(to):

102

Pages:

10

Pub. info.:

Bellingham, CA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448446 [0819448443]

Language:

English

Call no.:

P63600/5039

Type:

Conference Proceedings

Details

TDL ID:	ZA00013027
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in Resist Technology and Processing
Conf. info. (Number):	2003 : 20th
Conf. info. (Venue):	Santa Clara, CA
Conf. info. (Date):	2003.02.24-2003.02.26
Note for article:	Session 3. Materials for 157-nm Resists II ; 5039-10

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