Evaluation of novel fluorinated resist matrices for 157-nm lithography

Evaluation of novel fluorinated resist matrices for 157-nm lithography

Author(s):

Houlihan, F.M. ( Clariant Corp. (USA) )

Romano, A.R. ( Clariant Corp. (USA) )

Rentkiewicz, D. ( Clariant Corp. (USA) )

Sakamuri, R. ( Clariant Corp. (USA) )

Dammel, R.R. ( Clariant Corp. (USA) )

Conley, W. ( International SEMATECH (USA) )

Rich, G.K. ( International SEMATECH (USA) )

Miller, D. ( International SEMATECH (USA) )

Rhodes, L.F. ( Promerus LLC (USA) )

McDaniels, J.M. ( Promerus LLC (USA) )

Chang, C. ( Promerus LLC (USA) )

6 more

Publication title:

Advances in Resist Technology and Processing XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5039

Pub. Year:

2003

Vol.:

1

Pt.:

Session 2

Page(from):

22

Page(to):

32

Pages:

11

Pub. info.:

Bellingham, CA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448446 [0819448443]

Language:

English

Call no.:

P63600/5039

Type:

Conference Proceedings

Details

TDL ID:	ZA00013027
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in Resist Technology and Processing
Conf. info. (Number):	2003 : 20th
Conf. info. (Venue):	Santa Clara, CA
Conf. info. (Date):	2003.02.24-2003.02.26
Note for article:	Session 2. Materials for 157-nm Resists I ; 5039-03

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