Extendibility of chemically amplified resists: another brick wall? (Invited Paper)
- Author(s):
Hinsberg, W.D. ( IBM Almaden Research Ctr. (USA) ) Houle, F.A. ( IBM Almaden Research Ctr. (USA) ) Sanchez, M.I. ( IBM Almaden Research Ctr. (USA) ) Hoffnagle, J.A. ( IBM Almaden Research Ctr. (USA) ) Wallraff, G.M. ( IBM Almaden Research Ctr. (USA) ) Medeiros, D.R. ( IBM Thomas J. Watson Research Ctr. (USA) ) Gallatin, G.M. ( IBM Thomas J. Watson Research Ctr. (USA) ) Cobb, J.L. ( Motorola Digital DNA Labs. (USA) ) - Publication title:
- Advances in Resist Technology and Processing XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5039
- Pub. Year:
- 2003
- Vol.:
- 1
- Pt.:
- Session 1
- Page(from):
- 1
- Page(to):
- 14
- Pages:
- 14
- Pub. info.:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- Language:
- English
- Call no.:
- P63600/5039
- Type:
- Conference Proceedings
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