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Evaluation of alignment marks using ASML ATHENA alignment system in 90-nm BEOL process

Author(s):
Tan, C.-B. ( Nanyang Technological Univ. (Singapore) )
Yeo, S.-H. ( Nanyang Technological Univ. (Singapore) )
Koh, H.P. ( Chartered Semiconductor Manufacturing, Ltd. (Singapore) )
Koo, C.K. ( Chartered Semiconductor Manufacturing, Ltd. (Singapore) )
Foong, Y.M. ( Chartered Semiconductor Manufacturing, Ltd. (Singapore) )
Siew, Y.K. ( Chartered Semiconductor Manufacturing, Ltd. (Singapore) )
1 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5038
Pub. Year:
2003
Vol.:
2
Page(from):
1211
Page(to):
1218
Pages:
8
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448439 [0819448435]
Language:
English
Call no.:
P63600/5038
Type:
Conference Proceedings

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