Blank Cover Image

Web-based metrology performance diagnostics

Author(s):
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5038
Pub. Year:
2003
Vol.:
2
Page(from):
1203
Page(to):
1210
Pages:
8
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448439 [0819448435]
Language:
English
Call no.:
P63600/5038
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings 193-nm resist: ultralow voltage CD-SEM performance for sub-130-nm contact hole process

Ferri, J.E., Vieira, M., Reybrouck, M., Mastovich, M.E., Bowdoin, S., Brandom, R., Knutrud, P.C.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings CD-SEM-based critical shape metrology of integrated circuits

Gorelikov, D.V., Remillard, J., Sullivan, N.T.

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Electron beam metrology of 193-nm resists at ultralow voltage

Sullivan, N.T., Dixson, R., Bunday, B.D., Mastovich, M.E., Knutrud, P.C., Fabre, P., Brandom, R.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Low-impact resist metrology: the use of ultralow voltage for high-accuracy performance

Sundaram, G., Sullivan, N.T., Mai, T., Ke, C.-M.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings CD-SEM image acquisition effects on 193-nm resists line slimming

Sullivan, N.T., Mastovich, M.E., Bowdoin, S., Brandom, R.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Metrology of inkjet MEMS devices

McKay, R., Redmond, S., Weller, R., Yamamoto, K., Sundaram, G.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Application of attenuated phase-shift masks to sub-0.18-ｦﾌm logic patterns

Fritze,M., Wyatt,P.W., Astolfi,D.K., Davis,P., Curtis,A.V., Preble,D.M., Cann,S.G., Denault,S., Chan,D., Shaw,J.C., …

SPIE - The International Society for Optical Engineering
10 Conference Proceedings Simulation of the XMM mirror performance based on metrology data

Gondoin,Ph., Beijersbergen,M., Willingale,R., Chambure,D.de, Katwijk,K.van, Lumb,D.H., Peacock,A.J.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Investigation of full-field CD control of sub-100-nm gate features by phase-shift 248-nm lithography

Fritze,M., Tyrrell,B., Astolfi,D.K., Davis,P., Wheeler,B., Mallen,R., Jarmolowicz,J., Cann,S.G., Chan,D.Y., Rhyins,P.D., …

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Productivity enhancements in recipe creation for overlay metrology measurements

Vachellerie, V., Ristoiu, D., Deleporte, A.G., Poulingue, M., Bedin, Y., Arendt, R., Sundaram, G., Knutrud, P.C.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Low-voltage CD-SEM applications in MEMS devices

Redmond, S., Mckay, R., Mellard, M., Norris, C., Wonnacott, J., Mastovich, M.E.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Applications of image diagnostics to metrology quality assurance and process control

Allgair, J.A., Boksha, V.V., Bunday, B.D., Diebold, A.C., Cole, D.C., Davidson, M.P., Hutcheson, J.D., Gurnell, A.W., …

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12