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CMP and self-shadowing effect of overlay mark in metal sputtering process

Author(s):
  • Park, S.-J. ( Dongbu Electronics Co., Ltd. (South Korea) )
  • Kim, H.-R. ( Dongbu Electronics Co., Ltd. (South Korea) )
  • Lee, Y.-S. ( Dongbu Electronics Co., Ltd. (South Korea) )
  • Yang, W.-S. ( Dongbu Electronics Co., Ltd. (South Korea) )
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5038
Pub. Year:
2003
Vol.:
2
Page(from):
878
Page(to):
882
Pages:
5
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448439 [0819448435]
Language:
English
Call no.:
P63600/5038
Type:
Conference Proceedings

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