Blank Cover Image

Single wafer process to generate reliable swing

Author(s):
  • Gu, Y. ( Integrated Device Technology, Inc. (USA) )
  • Zhu, C. ( Integrated Device Technology, Inc. (USA) )
  • Sturtevant, J.L. ( Integrated Device Technology, Inc. (USA) )
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5038
Pub. Year:
2003
Vol.:
2
Page(from):
832
Page(to):
840
Pages:
9
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448439 [0819448435]
Language:
English
Call no.:
P63600/5038
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Resist compacting under SEM E-Beam

Gu, Y., Chou, D., Sturtevant, J.L.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Contact-hole MEEF comparison between ALTA and 50-KeV written masks

Sturtevant, J.L., Opitz, J., Word, J.C.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Assist feature OPC implementation for the 130-nm technology node with KrF and no forbidden pitches

Word, J.C., Zhu, S., Sturtevant, J.L.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Characterization and reduction of highly localized substrate contamination defects in metal patterning

Gu, Y., Zhang, A., Yu, Z., Cao, W., Chen, S., Sturtevant, J.L., Lee, S.K.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Reduction of implantation shadowing effect by dual-wavelength exposure photo process

Gu, Y., Chou, D., Lee, S.Y., Roche, W.R., Sturtevant, J.L.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Single-wafer process integration and process control techniques

Moslehi M. M., Lee J. Y., Schaper C., Omstead T., Velo L., Kermani A., Davis C.

Kluwer Academic Publishers
4 Conference Proceedings Reduction of reflective notching through illumination optimization

Word, J.C., Chou, D., Gu, Y., Sturtevant, J.L.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Enabling Single-Wafer Process Technologies for Reliable Ultra-Thin Gate Dielectrics

Miner, G., Xing, G., Joo, H.S., Sonchez, F., Yokoa, Y., Chen, C., Lopes, D., Balakrishna, A.

Electrochemical Society
5 Conference Proceedings Manufacturing requirements for a single-wafer develop process

E.H. Bokelberg, J.L. Goetz

Society of Photo-optical Instrumentation Engineers
11 Conference Proceedings Antireflection coating process characterization and improvement for DUV lithography at 0.25 µm: ground rules

J.L. Sturtevant, M. Chaara, R. Elliot, L.D. Hollifield, R.A. Soper

Society of Photo-optical Instrumentation Engineers
6 Conference Proceedings Theoretical and experimental optimization of numerical aperture and partial coherence for complementary phase-shift processes

Brodsky,C.J., Nelson-Thomas,C., Cave,N., Sturtevant,J.L.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings The infrared video image pseudocolor processing system

Zhu, Y., Zhang, J.L.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12