Investigation of model OPC optimization based on CD uniformity yield

Investigation of model OPC optimization based on CD uniformity yield

Author(s):

Roy, S. ( ASML MaskTools, Inc. (USA) )

Chen, J.F. ( ASML MaskTools, Inc. (USA) )

Liebchen, A. ( ASML MaskTools, Inc. (USA) )

Laidig, T.L. ( ASML MaskTools, Inc. (USA) )

Wampler, K.E. ( ASML MaskTools, Inc. (USA) )

Hollerbach, U. ( ASML MaskTools, Inc. (USA) )

1 more

Publication title:

Metrology, Inspection, and Process Control for Microlithography XVII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5038

Pub. Year:

2003

Vol.:

2

Page(from):

810

Page(to):

816

Pages:

7

Pub. info.:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448439 [0819448435]

Language:

English

Call no.:

P63600/5038

Type:

Conference Proceedings

Details

TDL ID:	ZA00013025
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2003 : 17th
Conf. info. (Venue):	Santa Clara, California, USA
Conf. info. (Date):	2003.02.24-2003.02.27
Note for article:	Poster Session ; 5038-90

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